Fa, Y., Piacentini, A., Macco, B., Kalisch, H., Heuken, M., Vescan, A., . . . Lemme, M. C. (2024). Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications.
Citazione stile Chigago Style (17a edizione)Fa, Yuan, Agata Piacentini, Bart Macco, Holger Kalisch, Michael Heuken, Andrei Vescan, Zhenxing Wang, e Max C. Lemme. Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors Through Reverse Sputtering-Induced Structural Modifications. 2024.
Citatione MLA (9a ed.)Fa, Yuan, et al. Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors Through Reverse Sputtering-Induced Structural Modifications. 2024.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.