Fa, Y., Piacentini, A., Macco, B., Kalisch, H., Heuken, M., Vescan, A., . . . Lemme, M. C. (2024). Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications.
Chicago Style (17th ed.) CitationFa, Yuan, Agata Piacentini, Bart Macco, Holger Kalisch, Michael Heuken, Andrei Vescan, Zhenxing Wang, and Max C. Lemme. Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors Through Reverse Sputtering-Induced Structural Modifications. 2024.
MLA (9th ed.) CitationFa, Yuan, et al. Contact Resistance Optimization in MoS${_2}$ Field-Effect Transistors Through Reverse Sputtering-Induced Structural Modifications. 2024.
Warning: These citations may not always be 100% accurate.