APA (7th ed.) Citation

Li, J., Wu, Q., & Weng, H. (2025). Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films.

Chicago Style (17th ed.) Citation

Li, Jiaheng, Quansheng Wu, and Hongming Weng. Stacking-dependent Electronic and Topological Properties in Van Der Waals Antiferromagnet MnBi$_2$Te$_4$ Films. 2025.

MLA (9th ed.) Citation

Li, Jiaheng, et al. Stacking-dependent Electronic and Topological Properties in Van Der Waals Antiferromagnet MnBi$_2$Te$_4$ Films. 2025.