Cita APA (7a ed.)

Peña, L. F., Anderson, E. M., Mudrick, J. P., Rosenberg, S. G., Scrymgeour, D. A., Bussmann, E., & Misra, S. (2025). A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF.

Cita Chicago Style (17a ed.)

Peña, Luis Fabián, Evan M. Anderson, John P. Mudrick, Samantha G. Rosenberg, David A. Scrymgeour, Ezra Bussmann, y Shashank Misra. A Reduced-temperature Process for Preparing Atomically Clean Si(100) and SiGe(100) Surfaces with Vapor HF. 2025.

Cita MLA (9a ed.)

Peña, Luis Fabián, et al. A Reduced-temperature Process for Preparing Atomically Clean Si(100) and SiGe(100) Surfaces with Vapor HF. 2025.