Cita APA (7a ed.)

Robert, H. L. L., Leidl, M. L., Müller-Caspary, K., & Verbeeck, J. (2025). Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials.

Cita Chicago Style (17a ed.)

Robert, Hoelen L. Lalandec, Max Leo Leidl, Knut Müller-Caspary, y Jo Verbeeck. Benchmarking Analytical Electron Ptychography Methods for the Low-dose Imaging of Beam-sensitive Materials. 2025.

Cita MLA (9a ed.)

Robert, Hoelen L. Lalandec, et al. Benchmarking Analytical Electron Ptychography Methods for the Low-dose Imaging of Beam-sensitive Materials. 2025.

Precaución: Estas citas no son 100% exactas.