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Main Authors: Guo, Qinhua, Xu, Zhiqing, Yang, Lizhou, Zhang, Jingyang, Gan, Yawen, Zhang, Jiajun, Jiang, Jiahao, Wang, Yunda
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2504.15078
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author Guo, Qinhua
Xu, Zhiqing
Yang, Lizhou
Zhang, Jingyang
Gan, Yawen
Zhang, Jiajun
Jiang, Jiahao
Wang, Yunda
author_facet Guo, Qinhua
Xu, Zhiqing
Yang, Lizhou
Zhang, Jingyang
Gan, Yawen
Zhang, Jiajun
Jiang, Jiahao
Wang, Yunda
contents Photolithography conventionally requires flat, rigid and stable substrates, limiting its applications in flexible, curved, and transient electronics. In this study, a breakthrough approach is reported that employs a reversibly adhesion-switchable phase-changing polymer to universally transfer commercial photoresists onto previously inaccessible substrates, overcoming fundamental limitations of conventional photolithography.
format Preprint
id arxiv_https___arxiv_org_abs_2504_15078
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Scalable High-Precision Microfabrication on Various Lithography-Incompatible Substrates and Materials Enabled by Wafer-Scale Transfer Lithography of Commercial Photoresists
Guo, Qinhua
Xu, Zhiqing
Yang, Lizhou
Zhang, Jingyang
Gan, Yawen
Zhang, Jiajun
Jiang, Jiahao
Wang, Yunda
Applied Physics
Photolithography conventionally requires flat, rigid and stable substrates, limiting its applications in flexible, curved, and transient electronics. In this study, a breakthrough approach is reported that employs a reversibly adhesion-switchable phase-changing polymer to universally transfer commercial photoresists onto previously inaccessible substrates, overcoming fundamental limitations of conventional photolithography.
title Scalable High-Precision Microfabrication on Various Lithography-Incompatible Substrates and Materials Enabled by Wafer-Scale Transfer Lithography of Commercial Photoresists
topic Applied Physics
url https://arxiv.org/abs/2504.15078