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Main Authors: Yang, Dongxun, Masayoshi, Tonouchi
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2504.21265
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author Yang, Dongxun
Masayoshi, Tonouchi
author_facet Yang, Dongxun
Masayoshi, Tonouchi
contents Laser-induced Terahertz (THz) Emission Spectroscopy (TES) has demonstrated its potential utility in the realm of Metal-Oxide-Semiconductor (MOS) devices as an expedient and noncontact estimation methodology. Owing to its discerning response to the interface electric field, the amplitude of the THz emission peak in time-domain spectroscopy encapsulates rich information regarding MOS properties, notably the flat-band voltage. This paper concentrates on the precise quantitative estimation of the flat-band voltage within the Si MOS structure, elucidating the intricacies of the estimation process through the THz emission model.
format Preprint
id arxiv_https___arxiv_org_abs_2504_21265
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Quantifying Flat-Band Voltage in Si Metal-Oxide-Semiconductor Structures: An Evaluation via Terahertz Emission Spectroscopy (TES)
Yang, Dongxun
Masayoshi, Tonouchi
Applied Physics
Laser-induced Terahertz (THz) Emission Spectroscopy (TES) has demonstrated its potential utility in the realm of Metal-Oxide-Semiconductor (MOS) devices as an expedient and noncontact estimation methodology. Owing to its discerning response to the interface electric field, the amplitude of the THz emission peak in time-domain spectroscopy encapsulates rich information regarding MOS properties, notably the flat-band voltage. This paper concentrates on the precise quantitative estimation of the flat-band voltage within the Si MOS structure, elucidating the intricacies of the estimation process through the THz emission model.
title Quantifying Flat-Band Voltage in Si Metal-Oxide-Semiconductor Structures: An Evaluation via Terahertz Emission Spectroscopy (TES)
topic Applied Physics
url https://arxiv.org/abs/2504.21265