APA (7th ed.) Citation

Li, T., Chen, Y., Li, Y., & Liu, L. (2025). Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning.

Chicago Style (17th ed.) Citation

Li, Tong, Yuqing Chen, Yanqiu Li, and Lihui Liu. Design of an All-facet Illuminator for High NA EUV Lithography Exposure Tool Based on Deep Reinforcement Learning. 2025.

MLA (9th ed.) Citation

Li, Tong, et al. Design of an All-facet Illuminator for High NA EUV Lithography Exposure Tool Based on Deep Reinforcement Learning. 2025.