Yang, S., Lehninger, D., Reinig, P., Schöne, F., Hoffmann, R., Seidel, K., . . . Gerlach, G. (2025). Enhanced Performance of FeFET Gate Stack via Heterogeneously co-doped Ferroelectric HfO$_2$ Films.
Chicago Style (17th ed.) CitationYang, Shouzhuo, David Lehninger, Peter Reinig, Fred Schöne, Raik Hoffmann, Konrad Seidel, Maximilian Lederer, and Gerald Gerlach. Enhanced Performance of FeFET Gate Stack via Heterogeneously Co-doped Ferroelectric HfO$_2$ Films. 2025.
MLA (9th ed.) CitationYang, Shouzhuo, et al. Enhanced Performance of FeFET Gate Stack via Heterogeneously Co-doped Ferroelectric HfO$_2$ Films. 2025.
Warning: These citations may not always be 100% accurate.