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Autori principali: Geng, Yanyan, Li, Chang, Mi, Shuo, Wang, Manyu, Han, Xinen, Hu, Huiji, Wang, Yunzhen, You, Haojie, Meng, Shumin, Wu, Hanxiang, Guo, Jianfeng, Zhu, Shiyu, Li, Yanjun, Sugawara, Yasuhiro, Hussain, Sabir, Pang, Fei, Xu, Rui, Cheng, Zhihai
Natura: Preprint
Pubblicazione: 2025
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Accesso online:https://arxiv.org/abs/2510.23139
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author Geng, Yanyan
Li, Chang
Mi, Shuo
Wang, Manyu
Han, Xinen
Hu, Huiji
Wang, Yunzhen
You, Haojie
Meng, Shumin
Wu, Hanxiang
Guo, Jianfeng
Zhu, Shiyu
Li, Yanjun
Sugawara, Yasuhiro
Hussain, Sabir
Pang, Fei
Xu, Rui
Cheng, Zhihai
author_facet Geng, Yanyan
Li, Chang
Mi, Shuo
Wang, Manyu
Han, Xinen
Hu, Huiji
Wang, Yunzhen
You, Haojie
Meng, Shumin
Wu, Hanxiang
Guo, Jianfeng
Zhu, Shiyu
Li, Yanjun
Sugawara, Yasuhiro
Hussain, Sabir
Pang, Fei
Xu, Rui
Cheng, Zhihai
contents The delicate interfacial conditions and behaviors play critical roles in determining the valuable physical properties of two-dimensional materials and their heterostructures on substrates. However, directly probing these complex interface conditions remains challenging. Here, we reveal the coupled in-plane strain and out-of-plane bonding conditions in strain-engineered WS2 flakes by combining dual-harmonic electrostatic force microscopy (DH-EFM) and scanning microwave impedance microscopy (sMIM). A striking contradiction is observed between the compressive-strain-induced larger bandgap (lower electrical conductivity) detected by DH-EFM, and the enhanced conductivity probed by sMIM. Comparative measurements under different sMIM modes demonstrate that this contradiction originates from a tip-loading-force-induced dynamic puckering effect, which is governed by the interfacial bonding strength. Furthermore, the progressive accumulation and subsequent release of conductivity during forward/backward sMIM-contact scans further confirms this dynamic puckering behavior, revealing pronounced differences in interface conditions between the open- and closed-ring regions of WS2. This work resolves the correlation between electrical properties and interface conditions, and provides fundamental insights for interface-engineered devices.
format Preprint
id arxiv_https___arxiv_org_abs_2510_23139
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Unveiling the delicate "hidden" interface conditions in WS2 flakes by advanced atomic force microscopy
Geng, Yanyan
Li, Chang
Mi, Shuo
Wang, Manyu
Han, Xinen
Hu, Huiji
Wang, Yunzhen
You, Haojie
Meng, Shumin
Wu, Hanxiang
Guo, Jianfeng
Zhu, Shiyu
Li, Yanjun
Sugawara, Yasuhiro
Hussain, Sabir
Pang, Fei
Xu, Rui
Cheng, Zhihai
Materials Science
The delicate interfacial conditions and behaviors play critical roles in determining the valuable physical properties of two-dimensional materials and their heterostructures on substrates. However, directly probing these complex interface conditions remains challenging. Here, we reveal the coupled in-plane strain and out-of-plane bonding conditions in strain-engineered WS2 flakes by combining dual-harmonic electrostatic force microscopy (DH-EFM) and scanning microwave impedance microscopy (sMIM). A striking contradiction is observed between the compressive-strain-induced larger bandgap (lower electrical conductivity) detected by DH-EFM, and the enhanced conductivity probed by sMIM. Comparative measurements under different sMIM modes demonstrate that this contradiction originates from a tip-loading-force-induced dynamic puckering effect, which is governed by the interfacial bonding strength. Furthermore, the progressive accumulation and subsequent release of conductivity during forward/backward sMIM-contact scans further confirms this dynamic puckering behavior, revealing pronounced differences in interface conditions between the open- and closed-ring regions of WS2. This work resolves the correlation between electrical properties and interface conditions, and provides fundamental insights for interface-engineered devices.
title Unveiling the delicate "hidden" interface conditions in WS2 flakes by advanced atomic force microscopy
topic Materials Science
url https://arxiv.org/abs/2510.23139