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| Autores principales: | , , , |
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| Formato: | Preprint |
| Publicado: |
2025
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| Materias: | |
| Acceso en línea: | https://arxiv.org/abs/2511.00349 |
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| _version_ | 1866908623371763712 |
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| author | Kong, Weiyou Kong, Weijia Chrostowski, Lukas Xin, Xin |
| author_facet | Kong, Weiyou Kong, Weijia Chrostowski, Lukas Xin, Xin |
| contents | Oxygen-plasma pre-cleans are routine before fabrication, but on BaTiO3 thin films we observed catastrophic photoresist lift-off during mild rinsing and sonication. To explain the failure, we combined optical microscopy, EDS, and XPS. EDS showed no meaningful bulk stoichiometry change, whereas XPS revealed a nanometer-scale, plasma-induced shift in surface chemistry: hydroxylation and carbonate formation consistent with a BaCO3-rich interphase at the resist/BaTiO3 boundary. This chemically weak interphase, recreated upon each plasma step and removable by simple solvent cleaning, provides the mechanism for delamination. The key takeaway for practitioners is process guidance: avoid uncritical O2-plasma use on BTO; if cleaning is required, use alternative chemistries (e.g., UV-ozone) or carefully tuned plasma windows that preserve adhesion. More broadly, the study illustrates how lightweight analytics at the surface (correlative microscopy + surface spectroscopy) can pinpoint the root cause of yield-limiting defects in oxide photonics and translate directly into higher-reliability process recipes. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2511_00349 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Impact of Oxygen Plasma Surface Treatment on Photoresist Adhesion in BaTiO3-Based Photonic Device Fabrication Kong, Weiyou Kong, Weijia Chrostowski, Lukas Xin, Xin Materials Science Oxygen-plasma pre-cleans are routine before fabrication, but on BaTiO3 thin films we observed catastrophic photoresist lift-off during mild rinsing and sonication. To explain the failure, we combined optical microscopy, EDS, and XPS. EDS showed no meaningful bulk stoichiometry change, whereas XPS revealed a nanometer-scale, plasma-induced shift in surface chemistry: hydroxylation and carbonate formation consistent with a BaCO3-rich interphase at the resist/BaTiO3 boundary. This chemically weak interphase, recreated upon each plasma step and removable by simple solvent cleaning, provides the mechanism for delamination. The key takeaway for practitioners is process guidance: avoid uncritical O2-plasma use on BTO; if cleaning is required, use alternative chemistries (e.g., UV-ozone) or carefully tuned plasma windows that preserve adhesion. More broadly, the study illustrates how lightweight analytics at the surface (correlative microscopy + surface spectroscopy) can pinpoint the root cause of yield-limiting defects in oxide photonics and translate directly into higher-reliability process recipes. |
| title | Impact of Oxygen Plasma Surface Treatment on Photoresist Adhesion in BaTiO3-Based Photonic Device Fabrication |
| topic | Materials Science |
| url | https://arxiv.org/abs/2511.00349 |