Mohseni, M., Varshney, S., Jeong, S. G., Walton, A., Frisbie, C. D., & Jalan, B. (2026). Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density.
Style de citation Chicago (17e éd.)Mohseni, Majid, Shivasheesh Varshney, Seung Gyo Jeong, Amber Walton, C. Daniel Frisbie, et Bharat Jalan. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.
Style de citation MLA (9e éd.)Mohseni, Majid, et al. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.
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