APA (7th ed.) Citation

Mohseni, M., Varshney, S., Jeong, S. G., Walton, A., Frisbie, C. D., & Jalan, B. (2026). Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density.

Chicago Style (17th ed.) Citation

Mohseni, Majid, Shivasheesh Varshney, Seung Gyo Jeong, Amber Walton, C. Daniel Frisbie, and Bharat Jalan. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.

MLA (9th ed.) Citation

Mohseni, Majid, et al. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.