Style de citation APA (7e éd.)

Mohseni, M., Varshney, S., Jeong, S. G., Walton, A., Frisbie, C. D., & Jalan, B. (2026). Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density.

Style de citation Chicago (17e éd.)

Mohseni, Majid, Shivasheesh Varshney, Seung Gyo Jeong, Amber Walton, C. Daniel Frisbie, et Bharat Jalan. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.

Style de citation MLA (9e éd.)

Mohseni, Majid, et al. Wafer-scale High-k SrTiO3 Dielectrics with Rational Barrier-layer Design for Low Leakage and High Charge Density. 2026.