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| Main Authors: | , , , , , , , , |
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| Format: | Preprint |
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2026
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2601.09379 |
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| _version_ | 1866917234269487104 |
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| author | Pulici, Andrea Seguini, Gabriele Taglietti, Fabiana Gumeniuk, Roman Chiarcos, Riccardo Laus, Michele Heitmann, Johannes Fanciulli, Marco Perego, Michele |
| author_facet | Pulici, Andrea Seguini, Gabriele Taglietti, Fabiana Gumeniuk, Roman Chiarcos, Riccardo Laus, Michele Heitmann, Johannes Fanciulli, Marco Perego, Michele |
| contents | The role of interface states and dielectric mismatch is studied in ultrathin P-doped silicon-on-insulator (SOI) films with thickness of the device layer ($H_{SOI}$) varying from 30 to 8 nm and dopant concentration ($n_{D}$) ranging from 10$^{18}$ to nearly 10$^{20}$ cm$^{-3}$. P concentration is determined by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). Sample resistivity ($ρ$), carrier concentration ($n_e$), and mobility ($μ_e$) are extracted by combining sheet resistance and Hall measurements in van der Pauw configuration. When $H_{SOI}$ = 30 nm, transport properties at room temperature are fully compatible with those of a similarly doped bulk Si. Progressive 2D confinement by reduction of $H_{SOI}$ below 30 nm results in a reduction of the carrier concentration and a concomitant degradation of $μ_e$. These effects, which are steadily enhanced decreasing $n_D$, are attributed to non-passivated interface states at the SiO$_2$/Si interface and can be significantly mitigated by high temperature rapid thermal oxidation (RTO). The effectiveness of this approach was verified by electron-paramagnetic resonance (EPR) spectra and capacitance-voltage (CV) measurements, which allowed the assessment of the quality of the RTO-SiO$_2$/Si interface and the correlation with observed electrical properties. After effective interface engineering, low temperature electrical characterization revealed a significant increase in P ionization energy in samples with $H_{SOI}$ <= 15 nm, a result directly related to the dielectric mismatch. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2601_09379 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Interface effects and dielectric mismatch in ultrathin silicon on insulator films Pulici, Andrea Seguini, Gabriele Taglietti, Fabiana Gumeniuk, Roman Chiarcos, Riccardo Laus, Michele Heitmann, Johannes Fanciulli, Marco Perego, Michele Mesoscale and Nanoscale Physics Materials Science The role of interface states and dielectric mismatch is studied in ultrathin P-doped silicon-on-insulator (SOI) films with thickness of the device layer ($H_{SOI}$) varying from 30 to 8 nm and dopant concentration ($n_{D}$) ranging from 10$^{18}$ to nearly 10$^{20}$ cm$^{-3}$. P concentration is determined by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). Sample resistivity ($ρ$), carrier concentration ($n_e$), and mobility ($μ_e$) are extracted by combining sheet resistance and Hall measurements in van der Pauw configuration. When $H_{SOI}$ = 30 nm, transport properties at room temperature are fully compatible with those of a similarly doped bulk Si. Progressive 2D confinement by reduction of $H_{SOI}$ below 30 nm results in a reduction of the carrier concentration and a concomitant degradation of $μ_e$. These effects, which are steadily enhanced decreasing $n_D$, are attributed to non-passivated interface states at the SiO$_2$/Si interface and can be significantly mitigated by high temperature rapid thermal oxidation (RTO). The effectiveness of this approach was verified by electron-paramagnetic resonance (EPR) spectra and capacitance-voltage (CV) measurements, which allowed the assessment of the quality of the RTO-SiO$_2$/Si interface and the correlation with observed electrical properties. After effective interface engineering, low temperature electrical characterization revealed a significant increase in P ionization energy in samples with $H_{SOI}$ <= 15 nm, a result directly related to the dielectric mismatch. |
| title | Interface effects and dielectric mismatch in ultrathin silicon on insulator films |
| topic | Mesoscale and Nanoscale Physics Materials Science |
| url | https://arxiv.org/abs/2601.09379 |