APA (7th ed.) Citation

Kim, J., Moon, M., Cho, H., Kim, H., Kim, R., Park, G., . . . Kang, Y. (2026). Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential.

Chicago Style (17th ed.) Citation

Kim, Jaehoon, Minseok Moon, Hyunsung Cho, Hyeon-Deuk Kim, Rokyeon Kim, Gyehyun Park, Seungwu Han, and Youngho Kang. Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential. 2026.

MLA (9th ed.) Citation

Kim, Jaehoon, et al. Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential. 2026.