Saved in:
Bibliographic Details
Main Authors: Guo, Shujin, Shi, Qing, Guo, Deping, Liu, Fei, Kong, Xianghua, Zhao, Yonghong, Guo, Hong
Format: Preprint
Published: 2026
Subjects:
Online Access:https://arxiv.org/abs/2603.11819
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866910050492088320
author Guo, Shujin
Shi, Qing
Guo, Deping
Liu, Fei
Kong, Xianghua
Zhao, Yonghong
Guo, Hong
author_facet Guo, Shujin
Shi, Qing
Guo, Deping
Liu, Fei
Kong, Xianghua
Zhao, Yonghong
Guo, Hong
contents The cold source field-effect transistor (CSFET) is promising for reducing power dissipation in integrated circuits by engineering the density of states at the injecting source. Existing CSFET designs utilizing Dirac-source metals or p-Metal-n stacks are challenged by Schottky barriers at the metal-semiconductor interface. In this work, a 2D WTe$_2$/HfS$_2$ heterojunction with type-III band alignment is proposed to be an excellent design of cold source and CSFET. The architecture has a high band-to-band transport mechanism by removing the detrimental Schottky barrier issues. Importantly, the proposed CSFET has the same channel barrier modulation principle as conventional MOSFET to enable a high on-state current. Using first-principles-based quantum transport modeling, we predict a very high $I_{\rm on}$/$I_{\rm off}$ ratio at $\sim$ 10$^{10}$, a low subthreshold swing below the thermal limit for a wide range of gate voltages, reaching as small as 41.3 mV/dec, at low source-drain bias $V_{DS}=0.3$ $\rm V$. These findings establish a design principles for next-generation low-power nanoelectronic switches leveraging 2D van der Waals heterostructures.
format Preprint
id arxiv_https___arxiv_org_abs_2603_11819
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Cold source field-effect transistor with type-III band-aligned HfS$_2$/WTe$_2$ heterostructure
Guo, Shujin
Shi, Qing
Guo, Deping
Liu, Fei
Kong, Xianghua
Zhao, Yonghong
Guo, Hong
Materials Science
Mesoscale and Nanoscale Physics
The cold source field-effect transistor (CSFET) is promising for reducing power dissipation in integrated circuits by engineering the density of states at the injecting source. Existing CSFET designs utilizing Dirac-source metals or p-Metal-n stacks are challenged by Schottky barriers at the metal-semiconductor interface. In this work, a 2D WTe$_2$/HfS$_2$ heterojunction with type-III band alignment is proposed to be an excellent design of cold source and CSFET. The architecture has a high band-to-band transport mechanism by removing the detrimental Schottky barrier issues. Importantly, the proposed CSFET has the same channel barrier modulation principle as conventional MOSFET to enable a high on-state current. Using first-principles-based quantum transport modeling, we predict a very high $I_{\rm on}$/$I_{\rm off}$ ratio at $\sim$ 10$^{10}$, a low subthreshold swing below the thermal limit for a wide range of gate voltages, reaching as small as 41.3 mV/dec, at low source-drain bias $V_{DS}=0.3$ $\rm V$. These findings establish a design principles for next-generation low-power nanoelectronic switches leveraging 2D van der Waals heterostructures.
title Cold source field-effect transistor with type-III band-aligned HfS$_2$/WTe$_2$ heterostructure
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2603.11819