Fully Atomic-Layer-Deposited Vertical Complementary FeRAM with Ultra-High 2Pr > 100 uC/cm2 and High Endurance > 1E10 cycles

Fuente: arXiv

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Bibliographic Details
Main Authors:	Xue, Renhao, Yan, Ruizhan, Chan, Mansun, Liu, Xiwen
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2604.15131