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Main Authors: Corre, Brieg Le, Grenèche, Clothilde, Bernard, Rozenn, Rohel, Tony, Létoublon, Antoine, Khelifi, Wijden, Pouliquen, Julie Le, Grisard, Arnaud, Combrié, Sylvain, Gérard, Bruno, Harouri, Abdelmounaim, Gratiet, Luc Le, Beaudoin, Grégoire, Pantzas, Konstantinos, Sagnes, Isabelle, Skibitzki, Oliver, Patriarche, Gilles, Cornet, Charles, Léger, Yoan
Format: Preprint
Published: 2026
Subjects:
Online Access:https://arxiv.org/abs/2604.15812
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author Corre, Brieg Le
Grenèche, Clothilde
Bernard, Rozenn
Rohel, Tony
Létoublon, Antoine
Khelifi, Wijden
Pouliquen, Julie Le
Grisard, Arnaud
Combrié, Sylvain
Gérard, Bruno
Harouri, Abdelmounaim
Gratiet, Luc Le
Beaudoin, Grégoire
Pantzas, Konstantinos
Sagnes, Isabelle
Skibitzki, Oliver
Patriarche, Gilles
Cornet, Charles
Léger, Yoan
author_facet Corre, Brieg Le
Grenèche, Clothilde
Bernard, Rozenn
Rohel, Tony
Létoublon, Antoine
Khelifi, Wijden
Pouliquen, Julie Le
Grisard, Arnaud
Combrié, Sylvain
Gérard, Bruno
Harouri, Abdelmounaim
Gratiet, Luc Le
Beaudoin, Grégoire
Pantzas, Konstantinos
Sagnes, Isabelle
Skibitzki, Oliver
Patriarche, Gilles
Cornet, Charles
Léger, Yoan
contents Direct orientation contrast imaging of zinc-blende III-V materials is studied using scanning electron microscopy. A quantitative approach is taken using a 3 μm thick orientation-patterned GaP grown on GaAs sample, studying the anti-phase domain contrast with respect to the electron beam energy and the tilt angle. A qualitative approach is taken for III-V grown on non-polar materials with and without chemical mechanical polishing. Finally, a processing of the acquired image for GaP on Si reveals in plane preferential anti-phase boundaries.
format Preprint
id arxiv_https___arxiv_org_abs_2604_15812
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Direct Orientation Contrast Imaging of Anti-Phase Domains on III-V Materials Using Scanning Electron Microscopy
Corre, Brieg Le
Grenèche, Clothilde
Bernard, Rozenn
Rohel, Tony
Létoublon, Antoine
Khelifi, Wijden
Pouliquen, Julie Le
Grisard, Arnaud
Combrié, Sylvain
Gérard, Bruno
Harouri, Abdelmounaim
Gratiet, Luc Le
Beaudoin, Grégoire
Pantzas, Konstantinos
Sagnes, Isabelle
Skibitzki, Oliver
Patriarche, Gilles
Cornet, Charles
Léger, Yoan
Materials Science
Applied Physics
Direct orientation contrast imaging of zinc-blende III-V materials is studied using scanning electron microscopy. A quantitative approach is taken using a 3 μm thick orientation-patterned GaP grown on GaAs sample, studying the anti-phase domain contrast with respect to the electron beam energy and the tilt angle. A qualitative approach is taken for III-V grown on non-polar materials with and without chemical mechanical polishing. Finally, a processing of the acquired image for GaP on Si reveals in plane preferential anti-phase boundaries.
title Direct Orientation Contrast Imaging of Anti-Phase Domains on III-V Materials Using Scanning Electron Microscopy
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2604.15812