APA (7th ed.) Citation

Leroch, S., Stella, R., Hössinger, A., & Filipovic, L. (2026). The influence of implantation conditions on dopant activation in Al-implanted 4H-SiC: A MD study applying an Al potential fitted to DFT barriers.

Chicago Style (17th ed.) Citation

Leroch, Sabine, Robert Stella, Andreas Hössinger, and Lado Filipovic. The Influence of Implantation Conditions on Dopant Activation in Al-implanted 4H-SiC: A MD Study Applying an Al Potential Fitted to DFT Barriers. 2026.

MLA (9th ed.) Citation

Leroch, Sabine, et al. The Influence of Implantation Conditions on Dopant Activation in Al-implanted 4H-SiC: A MD Study Applying an Al Potential Fitted to DFT Barriers. 2026.