Cita APA (7a ed.)

Yao, W., Li, Z., Bai, G., Gao, J., Yu, J., Li, J., . . . Luo, J. (2026). Si/SiGe multi-channel superlattice structure epitaxial growth with segmented temperature control for Next-Generation Logic Devices.

Cita Chicago Style (17a ed.)

Yao, Wenlong, Zhigang Li, Guobin Bai, Jianfeng Gao, Jiahan Yu, Junfeng Li, Xiaolei Wang, y Jun Luo. Si/SiGe Multi-channel Superlattice Structure Epitaxial Growth with Segmented Temperature Control for Next-Generation Logic Devices. 2026.

Cita MLA (9a ed.)

Yao, Wenlong, et al. Si/SiGe Multi-channel Superlattice Structure Epitaxial Growth with Segmented Temperature Control for Next-Generation Logic Devices. 2026.