Saved in:
| Main Authors: | , , , , , , |
|---|---|
| Format: | Preprint |
| Published: |
2026
|
| Subjects: | |
| Online Access: | https://arxiv.org/abs/2605.14329 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Table of Contents:
- We report N-polar AlN-based high-electron mobility transistors (HEMTs) with a GaN channel thickness of 5.2 nm on N-polar AlN on sapphire. The threshold voltage is around -2.4 to -3.0 V with saturation currents over 240 mA/mm and on/off ratios as high as 10,000, much higher than previously reported N-polar AlN-based HEMTs. The high on/off ratio is attributed to the use of an abrupt AlN/GaN heterostructure with a dedicated AlN transition layer, together with improved gate leakage. The high frequency properties as well as the on-resistance of ~20 Ohm mm are all limited by the 2000 Ohm/square sheet resistance of the channel layer.