Goyal, S., Singh, K. V., Dusane, R. O., & Muneshwar, T. P. (2026). Catalytic precursor dissociation in Hot-Wire CVD and comparing a-Si: H growth under continuous and pulsed silane flow conditions.
Style de citation Chicago (17e éd.)Goyal, Swati, Karam Veer Singh, Rajiv O. Dusane, et Triratna P. Muneshwar. Catalytic Precursor Dissociation in Hot-Wire CVD and Comparing A-Si: H Growth Under Continuous and Pulsed Silane Flow Conditions. 2026.
Style de citation MLA (9e éd.)Goyal, Swati, et al. Catalytic Precursor Dissociation in Hot-Wire CVD and Comparing A-Si: H Growth Under Continuous and Pulsed Silane Flow Conditions. 2026.
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